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Comparison of Thin Thermal SiO[sub 2] Grown Using HCl and 1,1,1 Trichloroethane (TCA)
Cosway, Richard G.Volume:
132
Year:
1985
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2113751
File:
PDF, 472 KB
english, 1985