Properties of Pr-based high k dielectric films obtained by...

MRS Proceedings 2004 / 1 Vol. 811

Properties of Pr-based high k dielectric films obtained by Metal-Organic Chemical Vapor Deposition

Nigro, Raffaella Lo, Toro, Roberta G., Malandrino, Graziella, Raineri, Vito, Fragalà, Ignazio L.
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Volume:
811
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-811-D9.10
Date:
January, 2004
File:
PDF, 834 KB
english, 2004
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