Silicon-Carbon Source and Drain Stressors: Carbon Profile Design by Ion Implantation
Zhou, Qian, Koh, Shao-Ming, Tong, Yi, Henry, Todd, Erokhin, Yuri, Yeo, Yee-ChiaVolume:
159
Year:
2012
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/2.072204jes
File:
PDF, 656 KB
english, 2012