Monitoring defects in III–V materials: A nanoscale CAFM...

Microelectronic Engineering 2015 / 11 Vol. 147

Monitoring defects in III–V materials: A nanoscale CAFM study

Iglesias, V., Wu, Q., Porti, M., Nafría, M., Bersuker, G., Cordes, A.
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Volume:
147
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.04.058
Date:
November, 2015
File:
PDF, 2.55 MB
english, 2015
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