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25 nm Wide Silicon Trench Fabrication by Edge Lithography
Sakamoto, Junji, Kawata, Hiroaki, Yasuda, Masaaki, Hirai, YoshihikoVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.08KC03
Date:
August, 2011
File:
PDF, 856 KB
english, 2011