25 nm Wide Silicon Trench Fabrication by Edge Lithography

Japanese Journal of Applied Physics 2011 / 8 Vol. 50; Iss. 8

25 nm Wide Silicon Trench Fabrication by Edge Lithography

Sakamoto, Junji, Kawata, Hiroaki, Yasuda, Masaaki, Hirai, Yoshihiko
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.08KC03
Date:
August, 2011
File:
PDF, 856 KB
english, 2011
Conversion to is in progress
Conversion to is failed