Aqueous Based Single Wafer Cleaning Process Development and...

MRS Proceedings 2006 / 1 Vol. 914

Aqueous Based Single Wafer Cleaning Process Development and Integration into 65nm Process Flow using Metal Hard Mask

Lin, Miao-Chun, Wang, Mei-Qi, Weng, Cheng-Ming, Chou, Chopin, Liao, JH, Tang, Jianshe, Weng, Willey, Lu, Wei, Chen, Han-Wen, Lee, John TC
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Volume:
914
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0914-F09-05
Date:
January, 2006
File:
PDF, 1.24 MB
english, 2006
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