New Thermal Donors and Processes Associated with Oxygen...

Materials Science Forum 1989 Vol. 38-41

New Thermal Donors and Processes Associated with Oxygen Clustering in Cz-Si at 600° C

Schmalz, K., Tittelbach, K., Emtsev, Valentin V., Daluda, Yu.N.
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Volume:
38-41
Year:
1989
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.38-41.667
File:
PDF, 406 KB
1989
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