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Slurry Particle Agglomeration Model for Chemical Mechanical Planarization (CMP)
Johnson, Joy Marie, Boning, DuaneVolume:
1249
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1249-E04-03
Date:
January, 2010
File:
PDF, 271 KB
english, 2010