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Modifications of an Internal Friction Apparatus for the Study of Dislocation Motion in Semiconductors
Tondellier, T., Woirgard, J., Demenet, J.L.Volume:
206-207
Year:
2002
Journal:
Defect and Diffusion Forum
DOI:
10.4028/www.scientific.net/DDF.206-207.175
File:
PDF, 304 KB
2002