Electrical Characteristics of Plasma-Enhanced Chemical...

Materials Science Forum 2003 Vol. 433-436

Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

Pham, Hoa Thi Mai, Akkaya, Tolgay, de Boer, Charles R., Sarro, Pasqualina M.
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Volume:
433-436
Year:
2003
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.433-436.451
File:
PDF, 179 KB
english, 2003
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