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Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56MHz)
Alim, Mohamed Mounis, Zekara, Mourad, Henni, Laid, Tadjine, Rabah, Henda, KarimVolume:
227
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.227.185
Date:
April, 2011
File:
PDF, 249 KB
english, 2011