Application of the Spectroscopic Ellipsometry for the CoSi2 Silicide Formation Induced by Thermal Annealing of Co/Si Multilayered Films
Kudryavtsev, Y.V., Sidorenko, S.I., Makogon, Yu.N., Pavlova, E.P., Verbitskaya, T.I., Lee, Y.P., Hyun, Y.H., Oksenenko, V.A.Volume:
237-240
Year:
2005
Journal:
Defect and Diffusion Forum
DOI:
10.4028/www.scientific.net/DDF.237-240.572
File:
PDF, 516 KB
2005