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Correction to Tailoring the Interface Quality between HfO 2 and GaAs via in Situ ZnO Passivation Using Atomic Layer Deposition
Byun, Young-Chul, Choi, Sungho, An, Youngseo, McIntyre, Paul C., Kim, HyoungsubVolume:
7
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.5b02372
Date:
April, 2015
File:
PDF, 169 KB
2015