Low-Pressure Deposition of TiN Thin Films from a...

Journal of Physical Chemistry 1995 / 05 Vol. 99; Iss. 21

Low-Pressure Deposition of TiN Thin Films from a Tetrakis(dimethylamido)titanium Precursor

Truong, C. M., Chen, P. J., Corneille, J. S., Oh, W. S., Goodman, D. W.
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Volume:
99
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100021a059
Date:
May, 1995
File:
PDF, 1.40 MB
english, 1995
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