Novel Anionic Photoacid Generators (PAGs) and Photoresists...

MRS Proceedings 2006 / 1 Vol. 961

Novel Anionic Photoacid Generators (PAGs) and Photoresists for sub 50 nm Patterning by EUVL and EBL

Wang, Mingxing, Lee, Cheng-Tsung, Henderson, Clifford L, Yueh, Wang, Roberts, Jeanette M, Gonsalves, Kenneth E
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Volume:
961
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0961-O11-04
Date:
January, 2006
File:
PDF, 909 KB
english, 2006
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