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Mechanism of Sidewall Necking and Bowing in the Plasma Etching of High Aspect-Ratio Contact Holes
Lee, Jin-Kwan, Jang, Il-Yong, Lee, Seung-Haeng, Kim, Chang-Koo, Moon, Sang HeupVolume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3276511
File:
PDF, 572 KB
english, 2010