The Effect of Ar/H2 Plasma Pretreatments on Porous K=2.0 Dielectrics for Pore Sealing by Self-Assembled Monolayers Deposition
Sun, Y., Swerts, J., Verdonck, P., Maheshwari, A., Prado, J.L., de Feyter, S., Armini, S.Volume:
195
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.195.146
Date:
December, 2012
File:
PDF, 811 KB
english, 2012