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Substrate Material for sub-0.25µm Si Technology Comparison of Hydrogen Annealed Wafers and Challengers: Evidence for Dopant Enhanced Diffusion
Bostelmann, M.T., Leroy, B.Volume:
69-70
Year:
1999
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.69-70.577
File:
PDF, 319 KB
1999