In situ analysis of negative-tone resist pattern formation...

Applied Physics Express 2014 / 01 Vol. 7; Iss. 1

In situ analysis of negative-tone resist pattern formation using organic-solvent-based developer process

Santillan, Julius Joseph, Yamada, Keisaku, Itani, Toshiro
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Volume:
7
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.7.016501
Date:
January, 2014
File:
PDF, 705 KB
english, 2014
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