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Influence Analysis of CCD Miss-Distance and Corresponding Research of τ Compensatory Technology Based on Finite Memory
Huang, Hai Bo, Wang, Wei Hua, Zuo, TaoVolume:
474-476
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.474-476.309
Date:
April, 2011
File:
PDF, 284 KB
english, 2011