Dependence of Dissolution Point on Pattern Size of...

Japanese Journal of Applied Physics 2012 / 9 Vol. 51

Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.108002
Date:
September, 2012
File:
PDF, 468 KB
english, 2012
Conversion to is in progress
Conversion to is failed