Thermal Stability Improvement of NiSi on Gate by High...

Electrochemical and Solid-State Letters 2009 Vol. 12; Iss. 6

Thermal Stability Improvement of NiSi on Gate by High Dosage Germanium Implantation

Hsieh, Chih-Ming, Tsui, Bing-Yue, Hung, Yu-Ren, Yang, York, Shen, Ryan, Cheng, Sam, Lin, Tony
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Volume:
12
Year:
2009
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3115403
File:
PDF, 454 KB
english, 2009
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