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Modeling the effects of abrasive size, surface oxidizer concentration and binding energy on chemical mechanical polishing at molecular scale
Yongguang Wang, Yongwu Zhao, Xufang LiVolume:
41
Year:
2008
Language:
english
Pages:
9
DOI:
10.1016/j.triboint.2007.08.004
File:
PDF, 531 KB
english, 2008