Interference lithography at EUV and soft X-ray wavelengths:...

Microelectronic Engineering 2015 / 08 Vol. 143

Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

Mojarad, Nassir, Gobrecht, Jens, Ekinci, Yasin
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Volume:
143
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.03.047
Date:
August, 2015
File:
PDF, 2.29 MB
english, 2015
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