Polishing Characteristics of 4H-SiC Si-Face and C-Face by...

Materials Science Forum 2007 Vol. 556-557

Polishing Characteristics of 4H-SiC Si-Face and C-Face by Plasma Chemical Vaporization Machining

Sano, Yasuhisa, Watanabe, Masayo, Yamamura, Kazuya, Yamauchi, Kazuto, Ishida, Takeshi, Arima, Kenta, Kubota, Akihisa, Mori, Yuzo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
556-557
Year:
2007
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.556-557.757
File:
PDF, 791 KB
english, 2007
Conversion to is in progress
Conversion to is failed