Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO2 Precipitates
Danilin, A.B., Drakin, K.A., Malinin, A.A., Mordkovich, V.N., Petrov, A.F., Vyletalina, O.I.Volume:
19-20
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.19-20.405
Date:
January, 1991
File:
PDF, 364 KB
1991