Novel Ni Germanosilicide Technology Using N-Doped Ni and Ni...

Solid State Phenomena 2007 Vol. 121-123

Novel Ni Germanosilicide Technology Using N-Doped Ni and Ni Stack Structure for Nano CMOS Applications

Oh, Soon Young, Yun, Jang Gn, Kim, Yong Jin, Lee, Won Jae, Ji, Hee Hwan, Kim, Ui Sik, Cha, Han Seob, Heo, Sang Bum, Lee, Jeong Gun, Cho, Yoo Jeong, Han, Gil Jin, Kim, Yeong Cheul, Wang, Jin Suk, Lee,
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Volume:
121-123
Year:
2007
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.121-123.623
File:
PDF, 832 KB
english, 2007
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