ECS Transactions [ECS 219th ECS Meeting - Montreal, QC, Canada (May 1 - May 6, 2011)] - Flatband Voltage Tuning of HfSiON-Based Gate Stacks: Impact of High Temperature Activation Annealing and LaO
Boujamaa, Rachid, Baudot, Sylvain, Martinez, Eugénie, Renault, Olivier, Detlefs, Blanka, Zegenhagen, Jorg, Loup, Virginie, Martin, François, Gros-Jean, Mickael, Bertin, Francois, Dubourdieu, CatheriYear:
2011
Language:
english
DOI:
10.1149/1.3572320
File:
PDF, 215 KB
english, 2011