Dose Dependence of Defects in Silicon Produced by High Dose, High Temperature O+ Implantation
Hobbs, A., Barklie, R.C., Reeson, K.J., Hemment, P.L.F.Volume:
10-12
Year:
1986
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.10-12.1159
File:
PDF, 283 KB
1986