Crystallization of Amorphous Silicon by Excimer Laser...

Japanese Journal of Applied Physics 1994 / 10 Vol. 33; Iss. Part 2, No

Crystallization of Amorphous Silicon by Excimer Laser Annealing with a Line Shape Beam Having a Gaussian Profile

Jhon, Young Min, Kim, Dong Hwan, Chu, Hong, Choi, Sang Sam
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1438
Date:
October, 1994
File:
PDF, 1.39 MB
1994
Conversion to is in progress
Conversion to is failed