Carbon nitride films deposited by reactive sputtering and...

Carbon nitride films deposited by reactive sputtering and pulsed laser ablation

Toshiaki Yasui, Takayo Kotani, Kenji Fujiuchi, Hirokazu Tahara, Takao Yoshikawa
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Volume:
457
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2003.12.009
File:
PDF, 685 KB
english, 2004
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