Diffusion processes in NiTi/Si, NiTi/SiO2 and NiTi/Si3N4...

Thin Solid Films 2004 Vol. 458; Iss. 1-2

Diffusion processes in NiTi/Si, NiTi/SiO2 and NiTi/Si3N4 systems under annealing

I Jarrige, P Holliger, P Jonnard
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Volume:
458
Year:
2004
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2003.12.039
File:
PDF, 812 KB
english, 2004
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