Thickness determination for SiO2 films on Si by X-ray reflectometry at the Si K edge
M Krumrey, M Hoffmann, G Ulm, K Hasche, P Thomsen-SchmidtVolume:
459
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2003.12.100
File:
PDF, 138 KB
english, 2004