Etching characteristic and mechanism of BST thin films using inductively coupled Cl2/Ar plasma with additive CF4 gas
Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il KimVolume:
459
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2003.12.115
File:
PDF, 121 KB
english, 2004