Etching characteristic and mechanism of BST thin films...

Etching characteristic and mechanism of BST thin films using inductively coupled Cl2/Ar plasma with additive CF4 gas

Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim
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Volume:
459
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2003.12.115
File:
PDF, 121 KB
english, 2004
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