The influence of diffusion of fluorine compounds for...

Thin Solid Films 2004 Vol. 459; Iss. 1-2

The influence of diffusion of fluorine compounds for silicon lateral etching

Patrick Verdonck, Alec Goodyear, Nicholas St.John Braithwaite
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Volume:
459
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2003.12.117
File:
PDF, 315 KB
english, 2004
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