Peculiarities of thin film deposition by means of reactive...

Thin Solid Films 2004 Vol. 459; Iss. 1-2

Peculiarities of thin film deposition by means of reactive impulse plasma assisted chemical vapor deposition (RIPACVD) method

Aleksander Werbowy, Andrzej Olszyna, Krzysztof Zdunek, Aleksandra Sokołowska, Jan Szmidt, Adam Barcz
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Volume:
459
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2003.12.122
File:
PDF, 170 KB
english, 2004
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