A Method to Detect Oxygen Precipitates in Silicon Wafers by...

Journal of The Electrochemical Society 2000 Vol. 147; Iss. 11

A Method to Detect Oxygen Precipitates in Silicon Wafers by Highly Selective Reactive Ion Etching

Nakashima, Kenji, Watanabe, Yukihiko, Yoshida, Tomoyuki, Mitsushima, Yasuichi
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Volume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1394056
File:
PDF, 186 KB
english, 2000
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