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Gettering of Oxygen onto Buried Defect Layer in Hydrogen Implanted Silicon Wafers after Low Temperature Surface Saturation by Oxygen and Vacuum Annealing
Frantskevich, A.V., Saad, Anis M., Mazanik, A.V., Fedotov, A.K., Rau, E.I., Chigir, S.V.Volume:
95-96
Year:
2004
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.95-96.571
File:
PDF, 958 KB
english, 2004