![](/img/cover-not-exists.png)
Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean
Jin Kun Lan, Y.L. WangVolume:
469-470
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2004.06.193
File:
PDF, 757 KB
english, 2004