Mechanism of high density plasma chemical vapor deposition...

Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean

Jin Kun Lan, Y.L. Wang
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Volume:
469-470
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2004.06.193
File:
PDF, 757 KB
english, 2004
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