The effect of the CH4 plasma treatment on deposited SiOC(–H) films with low dielectric constant prepared by using TMS/O2 PECVD
Chang Sil Yang, Young Hun Yu, Heon-Ju Lee, Kwang-Man Lee, Chi Kyu ChoiVolume:
475
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.07.019
File:
PDF, 750 KB
english, 2005