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Interface engineering during plasma-enhanced chemical vapor deposition of porous/dense SiN1.3 optical multilayers
A. Amassian, R. Vernhes, J.E. Klemberg-Sapieha, P. Desjardins, L. MartinuVolume:
469-470
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2004.07.072
File:
PDF, 480 KB
english, 2004