Anisotropic Etching of SiC in the Mixed Gas of Chlorine and...

Anisotropic Etching of SiC in the Mixed Gas of Chlorine and Oxygen

Hatayama, Tomoaki, Shimizu, T., Yano, Hiroshi, Uraoka, Yukiharu, Fuyuki, Takashi
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Volume:
600-603
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.600-603.659
File:
PDF, 460 KB
english, 2009
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