Anisotropic Etching of SiC in the Mixed Gas of Chlorine and Oxygen
Hatayama, Tomoaki, Shimizu, T., Yano, Hiroshi, Uraoka, Yukiharu, Fuyuki, TakashiVolume:
600-603
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.600-603.659
File:
PDF, 460 KB
english, 2009