Plasma etching of (Ba,Sr)TiO3 thin films using inductively coupled Cl2/Ar and BCl3/Cl2/Ar plasma
Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il KimVolume:
475
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.08.028
File:
PDF, 378 KB
english, 2005