On the contributions of the electronic polarizability and porosity to the reduction of the refractive index of SiOF films deposited by remote plasma-enhanced chemical vapor deposition
J.C. Alonso, X.M. Díaz-Bucio, E. Pichardo, L. Rodríguez-Fernández, A. OrtizVolume:
474
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2004.08.078
File:
PDF, 276 KB
english, 2005