Structural characteristics and interfacial reactions of low...

Structural characteristics and interfacial reactions of low dielectric constant porous polysilazane for Cu metallization

J.H. Wang, P.T. Liu, T.S. Chang, T.C. Chang, L.J. Chen
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Volume:
469-470
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.09.014
File:
PDF, 365 KB
english, 2004
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