Erratum to "A new measurement technique for the...

Erratum to "A new measurement technique for the characterization of carrier lifetime in thin SOI MOSFETs" [Thin Solid Films 462–463 (2004) 6–10]

Yoshikata Nakajima, Hideki Tomita, Kenichi Aoto, Kenji Sasaki, Tatsuro Hanajiri, Toru Toyabe, Takitaro Morikawa, Takuo Sugano
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Volume:
488
Year:
2005
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2004.09.025
File:
PDF, 406 KB
english, 2005
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