Nanomechanical properties of silicon-, oxygen- and nitrogen-containing a-C:H films prepared by RF plasma beam CVD
A. Tóth, M. Mohai, T. Ujvári, I. BertótiVolume:
482
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2004.11.168
File:
PDF, 157 KB
english, 2005