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In situ tensile tests in SEM of sputtered CNx films deposited on Ti6Al4V substrate: effect of film thickness and plasma surface pretreatment
P. Villechaise, X. Milhet, B. Angleraud, V. Fouquet, L. Pichon, A. Straboni, P.Y. TessierVolume:
482
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2004.11.171
File:
PDF, 542 KB
english, 2005