![](/img/cover-not-exists.png)
Effects of the temperature and of the amount of Ge on the morphology of Ge islands grown by reduced pressure–chemical vapor deposition
J.M. Hartmann, F. Bertin, G. Rolland, M.N. Séméria, G. BrémondVolume:
479
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.tsf.2004.11.204
File:
PDF, 1.99 MB
english, 2005