Validation of the Dynamic Recrystallization (DRX) Mechanism for Whisker and Hillock Growth on Sn Thin Films
Vianco, P. T., Neilsen, M. K., Rejent, J. A., Grant, R. P.Language:
english
Journal:
Journal of Electronic Materials
DOI:
10.1007/s11664-015-3779-4
Date:
May, 2015
File:
PDF, 6.53 MB
english, 2015